Photothermal measurements on optical thin films

authored by

Eberhard Welsch, Detlev Ristau

Abstract

An overview of the application of the photothermal technique for optical as well as thermophysical characterizations of thin films is given. The peculiarities of this technique are discussed in some detail, and selected important results are pointed out. Emphasis is placed on the influence of both residual absorption and randomly distributed inhomogeneities in thin films on their laser-damage resistance.

External Organisation(s)

Friedrich Schiller University Jena
Laser Zentrum Hannover e.V. (LZH)

Type

Article

Journal

Applied Optics

Volume

34

Pages

7239-7253

No. of pages

15

ISSN

1559-128X

Publication date

11.1995

Publication status

Published

Peer reviewed

Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics, Engineering (miscellaneous), Electrical and Electronic Engineering

Electronic version(s)

https://doi.org/10.1364/AO.34.007239 (Access: Unknown)