Ionization energy of the oxygen donor in AlN

verfasst von
Barbara Szafranski, Lukas Peters, Stefan Wolter, Christoph Margenfeld, Andreas Waag, Tobias Voss
Abstract

Oxygen is a ubiquitous impurity in AlN that influences its optical and electronic properties. A precise determination of its electronic levels is essential for device-specific material-engineering. In this study, we report on the experimental determination of the ionization energy of the substitutional oxygen donor O

N in sputter-deposited and subsequently high-temperature annealed AlN templates using temperature-dependent and time-resolved cathodoluminescence spectroscopy. The slow component of the oxygen-related defect luminescence, associated with donor–acceptor pair recombination and with decay times of hundreds of nanoseconds, exhibits distinct thermal quenching at temperatures above 250 K. By fitting this temperature dependence with a model based on the thermal emission of electrons from the donor level, we extract an ionization energy E

D = 371 ± 77 meV for the oxygen donor in AlN. This experimental value is in excellent agreement with theoretical predictions for the shallow substitutional O

N donor and clearly distinct from calculated energies for the deeper oxygen DX center. This work provides an important experimental insight into this fundamental parameter in AlN.

Typ
Artikel
Journal
Applied physics letters
Band
128
ISSN
0003-6951
Publikationsdatum
26.01.2026
Publikationsstatus
Veröffentlicht
Peer-reviewed
Ja
ASJC Scopus Sachgebiete
Physik und Astronomie (sonstige)
Elektronische Version(en)
https://doi.org/10.1063/5.0308036 (Zugang: Unbekannt)
http://dx.doi.org/10.1063/5.0308036 (Zugang: Unbekannt)