Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

verfasst von: Wjatscheslaw Sakiew, Stefan Schrameyer, Marco Jupé, Philippe Schwerdtner, Nick Erhart, Kai Starke, Detlev Ristau
Abstract: In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta₂O₅ and TiO₂ films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m² were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.
Externe Organisation(en): Cutting Edge Coatings GmbH
Laser Zentrum Hannover e.V. (LZH)
Typ: Artikel
Journal: Thin Solid Films
Band: 682
Seiten: 109-120
Anzahl der Seiten: 12
ISSN: 0040-6090
Publikationsdatum: 10.05.2019
Publikationsstatus: Veröffentlicht
Peer-reviewed: Ja
ASJC Scopus Sachgebiete: Elektronische, optische und magnetische Materialien, Oberflächen und Grenzflächen, Oberflächen, Beschichtungen und Folien, Metalle und Legierungen, Werkstoffchemie
Elektronische Version(en): https://doi.org/10.1016/j.tsf.2019.05.027 (Zugang: Geschlossen)

BibTeX

@article{4344de7bea584b96857aa280ec5d5e9d,
title = "Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering",
abstract = "In the present study, the influence of different ion beam parameters onto the two-dimensional thickness distribution of optical coatings in an industrial scale coating process is investigated. Ta2O5 and TiO2 films were deposited by reactive ion beam sputtering under variation of ion species, ion beam current, ion energy and beamlet pattern of the applied ion optic. Also the distance between ion optic and target was varied. The corresponding thickness distributions over a planar area of 0.9 × 1.0 m2 were determined by the collection method and characterized with respect to maximum deposition rate, distribution width and deposition volume rate as a measure of productivity. To interpolate the discrete mapping data accurately, an empirical model function was determined. Concerning the ion beam current it has been verified that the maximum deposition rate and the deposition volume rate scale identically and directly proportional to the ion beam current. The normalized distribution itself is almost independent of the varied beam parameters. Furthermore, it has been found that the ion energies of 1.5 and 2.0 keV have no significant impact on the material distribution. In contrast, it was observed that the ion species and the distance between the ion optic and the target affect the productivity significantly.",
keywords = "Broad ion beam, Industrial scale coating process, Ion beam sputter deposition, Optical coatings, Tantalum pentoxide, Thickness distribution, Titanium dioxide",
author = "Wjatscheslaw Sakiew and Stefan Schrameyer and Marco Jup{\'e} and Philippe Schwerdtner and Nick Erhart and Kai Starke and Detlev Ristau",
note = "Funding information: The authors are grateful to the German Federal Ministry of Education and Research (Bundesministerium f{\"u}r Bildung und Forschung, BMBF) for the financial support of the research project PluTO plus (contract no. 13N13207). Furthermore, the authors want to thank Dr. Benjamin Lotz (GIESS GmbH) for preparation of an ion optic with an elliptical shaped beamlet pattern and the authors want to thank the referees for valuable comments on the manuscript.",
year = "2019",
month = may,
day = "10",
doi = "10.1016/j.tsf.2019.05.027",
language = "English",
volume = "682",
pages = "109--120",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
}